This is not to be confused with Fused Silica which is manufactured from synthetically derived Silicon Dioxide and is technically referred to as synthetic Fused Silica. However, in many applications, Fused Quartz and Fused Silica can be used interchangeably. The main differences are that Fused Quartz has much lower OH content (<100ppm) and Fused Silica transmits somewhat better in the UV.
Fused Quartz is a high purity material, and has high chemical resistance, good thermal shock resistance, strong compression characteristics, and low thermal expansion coefficient. Fused Quartz wafers, windows and substrates can be used for mirrors, viewing windows, optical flats, insulators and other optical, electronic and semiconductor applications.
Density: 2.21 g/cm3
Moh's Hardness: 7
Knoop Hardness: >600 kg/mm2
Compressive Strength: 650 - 1100 MPa@R.T.
Tensile Strength: 48 MPa@R.T.
Young's Modulus: 70 GPa
Flexural Strength (MOR): 80 MPa@R.T.
Poisson's Ratio: 0.17
Max. Use Temperature: 1200°C
Thermal Shock Resistance: >1400
Thermal Conductivity: 1.4 W/mK
Coefficient of Linear Thermal Expansion (CTE): 0.45
Specific Heat: 0.16 cal/g-°C@R.T.
Dielectric Constant: 3.75 at 20°C, 1MHz
Dielectric Loss: < 0.0004 at 20°C, 1MHz
Specific Resistivity: 1018
ohm/cm3 at 20°C
Dissipation Factor: < 0.0001 at 20°C, 1MHz
Delivery: From stock
Return to Home Page Optical polishing, lapping, dicing and optical components polishing
Updated: 10 January 2011
|
Advanced Search |
|
Valley Design East Two Shaker Road, Bldg. E-001 Shirley, MA 01464 Phone: 978.425.3030 Fax: 978.425.3031 |
Site Map |
Affiliate Sites
|
Valley Design West Santa Cruz, CA 95060 Phone: 831.420.0595 Fax: 831.420.0592 |
| Return to top of page |
|
|
| © 2012 Valley Design Corp. All Rights Reserved | ||